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Optical and X-Ray Characterization
Optical and X-ray techniques are powerful ways to characterize semiconductor thin films. They can be used to measure film thickness, purity and crystalline quality, and for compositional analysis. Modern techniques are fast, turn-key, and generally non-destructive, allowing for rapid assessment of material properties. This course describes the fundamentals of optical and X-ray characterization and provides real-world examples of how they are used in semiconductor manufacturing.
Duration
7 Months
Institution
Arizona State University
Format
Online
Eligibility Criteria
school
Academic Foundation
A recognized Bachelor’s degree or high school equivalent required for admission into Arizona State University.
language
Language Proficiency
English proficiency required. IELTS, TOEFL, or standard medium-of-instruction certificates accepted.
Detailed Fees Breakdown
Base Tuition Fee
$240
Total Est. Investment
$240
Scholarships and early-bird waivers may apply. Contact admissions for exact institutional fees.
Academic Trajectory
Program Outcome
Graduates of the Optical and X-Ray Characterization program at Arizona State University are equipped with global perspectives, ready to excel in international markets and top-tier career opportunities.